CVDダイヤモンド膜 -窒化ケイ素基板の密着性に及ぼすDLC中間層の効果 Effects of DLC Interlayer on the Adherence between CVD Diamond Film and Silicon Nitride Substrate

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Effects of a diamond-like carbon (DLC) interlayer on the interfacial microstructure and adherence between diamond film and a silicon nitride substrate were investigated. The substrate was pretreated in a strong acid solution, followed by ultrasonic microflawing pretreatment. DLC was found to be deposited into etched micropores and to form a uniform film for 2h by rf plasma CVD using CH<sub>4</sub>-H<sub>2</sub> reactant gas. Diamond film was then coated subsequently by microwave plasma CVD using CO-H<sub>2</sub> reactant gas. Fine-grained diamond was nucleated onto microflawed DLC film by first-stage CVD for 1h, and diamond film 35μm thick was prepared by second-stage CVD for 29h. Milling tests of the coated specimen using Al-20wt% Si alloy as the work material exhibited higher adherence and longer tool life than the diamond-coated specimen without the DLC interlayer.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan

    表面技術 = The Journal of the Surface Finishing Society of Japan 47(12), 1042-1047, 1996-12-01

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002257915
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    4106788
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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