Al-N膜の電気および光学特性の制御方法および傾斜機能膜の形成 Various Ways for Controlling Electrical and Optical Properties of Al-N Films and the Preparation of Gradient Al-AlN Films

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The optical and electrical properties of RF-sputtered Al-N films have been controlled by changing the content of nitrogen gas and total sputtering pressure. For Al-rich Al-N films, post-N<sup>+</sup>-implantation and post-heat-treatment in a nitrogen atmosphere effectively change optical and electrical properties. A new, colorful, wear-resistant, anticorrosion AlN/Al/AlN film has been made by adding a very thin layer of Al between two stoichiometric AlN layers, based on the phenomenon that the coloration of Al-N films is mainly caused by the extra Al in the film and the interference of light. A compositionally and structurally gradient Al-AlN film was fabricated. The structure, morphology, and Al element distribution across the cross section of the gradient film was investigated using X-ray diffraction, SEM, and EMPA

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan  

    表面技術 = The Journal of the Surface Finishing Society of Japan 47(12), 1048-1053, 1996-12-01 

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002257929
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    4106789
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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