スパッタ法でＡｌ‐Ｍｇ合金基板上に成膜したＡｌＮ薄膜の防食特性および皮膜構造に与える成膜時のＡｒガス圧の影響

• 山本 兼司

  (株) 神戸製鋼所 技術開発本部 材料研究所

• 中山 武典

  (株) 神戸製鋼所 技術開発本部 材料研究所

• 佐藤 廣士

  (株) 神戸製鋼所 技術開発本部 開発企画部

書誌事項

タイトル別名

• The Effects of Ar Pressure on Corrosion and Structural Property of r.f. Magnetron Sputtered AlN Thin Film Deposited on Al-Mg Alloy.
• スパッタホウ デ Al-Mg ゴウキン キバンジョウ ニ セイマクシタ AlN

抄録

A series of AlN thin films was synthesized on Al-25mass%Mg substrate under different Ar pressures from 007 to 1.3Pa using rf magnetron sputtering. The effects of Ar pressure on the corrosion protection in a 5mass%NaCl solution and structural properties were studied. As Ar pressure was increased above 027Pa, the corrosion resistance of the AlN-coated Al-Mg alloy was significantly improved. Residual film stress was compressive under low Ar pressures, which decreased as Ar pressure increased and turned tensile at high Ar pressures. An obvious correlation was observed between the corrosion protection property and residual stress. A coating with low residual stress was superior in corrosion protection to a coating with high compressive residual stress. The change of the corrosion protection property is discussed in connection with the residual stress of the sputtered film. The origin of the residual stress in the AlN coating is also discussed from the viewpoint of the energy change in sputtered particles.

収録刊行物

• 表面技術

  表面技術 48 (1), 42-48, 1997

  一般社団法人 表面技術協会

キーワード

• Sputtering
• Aluminum Nitride
• Corrosion Protection
• Ar Pressure
• Residual Stress

詳細情報

• CRID: 1390282679091050752
• NII論文ID: 10002258119
• NII書誌ID: AN1005202X
• DOI: 10.4139/sfj.48.42
• ISSN: 18843409
• ISSN: 09151869
• NDL書誌ID: 4118795
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4118795
• 本文言語コード: ja
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可