スパッタ法でAl-Mg合金基板上に成膜したAlN薄膜の防食特性および皮膜構造に与える成膜時のArガス圧の影響 The Effects of Ar Pressure on Corrosion and Structural Property of r. f. Magnetron Sputtered AlN Thin Film Deposited on Al-Mg Alloy

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A series of AlN thin films was synthesized on Al-25mass%Mg substrate under different Ar pressures from 007 to 1.3Pa using rf magnetron sputtering. The effects of Ar pressure on the corrosion protection in a 5mass%NaCl solution and structural properties were studied. As Ar pressure was increased above 027Pa, the corrosion resistance of the AlN-coated Al-Mg alloy was significantly improved. Residual film stress was compressive under low Ar pressures, which decreased as Ar pressure increased and turned tensile at high Ar pressures. An obvious correlation was observed between the corrosion protection property and residual stress. A coating with low residual stress was superior in corrosion protection to a coating with high compressive residual stress. The change of the corrosion protection property is discussed in connection with the residual stress of the sputtered film. The origin of the residual stress in the AlN coating is also discussed from the viewpoint of the energy change in sputtered particles.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan

    表面技術 = The Journal of the Surface Finishing Society of Japan 48(1), 42-48, 1997-01-01

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002258119
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    4118795
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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