Tiイオン注入による炭素薄膜の構造変化 Implantation Effect of Titanium Ions on Amorphous Carbon Thin Films

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Titanium ions accelerated at between 70 and 30kV were implanted in carbon thin films deposited on stainless steel and graphite substrates at room temperature to study structure changes in films and improve adhesion strength at the film/substrate interface. Film structure and composition were studied by grazing incidence X-ray diffraction, Auger electron spectroscopy, X-ray photoelectron spectroscopy, and Raman spectroscopy. Adhesion strength was measured using a pull test. TiC crystalline phase formation in carbon thin films by titanium implantation was observed. The graphitic structure in evaporated films and graphite substrate were changed to an amorphous structure by ion implantation. Film adhesion strength was enhanced by ion implantation, which generated a well mixed layer at the film/substrate interface.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan  

    表面技術 = The Journal of the Surface Finishing Society of Japan 48(3), 313-316, 1997-03-01 

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002258587
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    4160919
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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