直流バイアス電圧印加高周波プラズマ窒化による純鉄の表面改質 Surface Modification of Pure Iron by rf Plasma Nitriding with dc Bias Voltage Impression
In rf plasma nitriding of a pure iron substrate with dc bias voltage impression, a thick, hardened nitrided layer formed rapidly by negative bias voltage impression to the substrate in pure nitrogen plasma. The attraction of ions onto the specimen may be accelerated and nitrogen plasma activity promoted by increasing the dc power input into rf plasma. The addition of hydrogen into nitrogen plasma did not accelerated the nitriding, however, because of denitrification from the nitrided surface layer. This may be due to the catalytic effect of iron to form NH<sub>3</sub>. The nitrided layer, however, was obtained by the addition of negative bias voltage to the specimen, perhaps because iron specimen nitriding with negative bias impression overcomes denitrification by hydrogen.
- 表面技術 = The Journal of the Surface Finishing Society of Japan
表面技術 = The Journal of the Surface Finishing Society of Japan 48(3), 317-323, 1997-03-01
The Surface Finishing Society of Japan