無電解ニッケルめっきによる異方性導電微粒子の作製 Preparation of Anisotropic Conductive Particles by Electroless Nickel Plating

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抄録

Demand for mechanical solderless chip connection methods using anisotropic conductive particles has increased in the field of electronic devises. In this study, the preparation of conductive resin particles (5 to 10μm in diameter) by electroless nickel plating and the surface morphology of nickel film were investigated. Since the surface area of particles are much larger than in a bulk substrate, a batch-type electroless plating bath is unstable. Therefore, we applied the continuous dropping method to improve the stability of the Electroless nickel plating. The surface morphology of the deposited nickel was greatly influenced by the complexing agent used, the bath temperatrue and solution pH. Uniform deposits on the particles were obtained at pH 5 by using ammonium acetate as the complexing agent. In contrast, extraneous deposits were recognized at pH 5 when using sodium tartrate as the complexing agent and in baths at pH6. This extraneous deposition could be decreased by lowering the bath temperature.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan

    表面技術 = The Journal of the Surface Finishing Society of Japan 48(4), 429-432, 1997-04-01

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002258885
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    4184935
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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