ダイナミックイオンミキシング法によるＴｉ１－ｘＡｌｘＮ膜の電気化学インピーダンス特性

• 神谷 誠

  工学院大学大学院

• 中村 勲

  工学院大学大学院

• 鷹野 一朗

  工学院大学工学部

• 澤田 芳夫

  工学院大学工学部

書誌事項

タイトル別名

• Electrochemical Impedance Property of Ti1-xAlxN Films Prepared by Dynamic Ion Mixing Method.
• ダイナミック イオン ミキシングホウ ニヨル Ti1-xAlxN マク ノ デ

抄録

The advanced coating material TiAlN has higher corrosion resistance than TiN without Al content. TiAlN films are conventionally prepared by sputtering using a target with fixed Ti and Al composition. We prepared Ti_1-xAl_xN films using a dynamic ion mixing apparatus with two electron-beam evaporation sources for Ti and Al deposition. Ti and Al contents of films were changed by independently controlling the evaporation rate of the two sources at a constant N concentration of 30%. This system controls the film Ti and Al composition ratio (value x) precisely.<br>Electrochemical film properties were measured using AC impedance and a fast Fourie transform analyzer. The measurement cell was constructed from two Ti_1-xAl_xN film samples coated on stainless steel used as electrodes in an HCl solution of 1mol/dm³. The equivalent circuit of the cell based on a typical parallel circuit, took film resistance R_f and capacity C_f into consideration and was determined by P-Spice simulation. Electrochemical properties were evaluated using interfacial resistance R_t, electrical double-layer capacity C_d and time constant R_t×C_d parameters. The Ti and Al composition ratio for optimum corrosion resistance was x=03.

収録刊行物

• 表面技術

  表面技術 48 (9), 913-918, 1997

  一般社団法人 表面技術協会

キーワード

• TiAlN
• Dynamic Ion Mixing
• AC Impedance
• Electrochemical Property

詳細情報

• CRID: 1390001204113662336
• NII論文ID: 10002259832
• NII書誌ID: AN1005202X
• DOI: 10.4139/sfj.48.913
• ISSN: 18843409
• ISSN: 09151869
• NDL書誌ID: 4304535
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4304535
• 本文言語コード: ja
• データソース種別:
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  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可