無電解NiBめっきにおける錯化剤の影響 Effect of Complexing Agents on Electroless NiB Plating

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抄録

The effect of four complexing agents-sodium citrate, sodium malonate, glycine and diethylenetriamine-on electroless NiB plating using dimethylamine-borane (DMAB) as a reducing agent was studied. The deposition rate was influenced by the pH, DMAB concentration, and the complexing agent species. The B and C content of deposited films, in particular, was strongly influenced by the complexing agent species. The B content of film deposited from a sodium citrate bath in a pH of 6.5 and 003mol dm<sup>-3</sup> DMAB concentration was the highest -5.41wt%-, while the C content was lower -01wt%-. The C content of film deposited from a diethylenetriamine bath at a pH 7.5 and the same DMAB concentration as given above was, in contrast, the highest -0.29wt%-, and the B content was lower -1.34wt%-. XRD results indicated that, in our study, as-deposited films showed an amorphous structure when the condition was such that the boron content was more than 2.5wt%. Such as-deposited films were crystallized by heat treatment at 300°C for 1hr. The lattice distance of Ni (111) was shifted from 0.2017nm to 0.2032nm, and the content of C was found to have increased.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan

    表面技術 = The Journal of the Surface Finishing Society of Japan 48(11), 1099-1104, 1997-11-01

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002260227
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    4334600
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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