Effect of Complexing Agents on Electroless NiB Plating.

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  • 無電解ＮｉＢめっきにおける錯化剤の影響
  • ムデンカイ NiB メッキ ニ オケル サクカザイ ノ エイキョウ

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Abstract

The effect of four complexing agents-sodium citrate, sodium malonate, glycine and diethylenetriamine-on electroless NiB plating using dimethylamine-borane (DMAB) as a reducing agent was studied. The deposition rate was influenced by the pH, DMAB concentration, and the complexing agent species. The B and C content of deposited films, in particular, was strongly influenced by the complexing agent species. The B content of film deposited from a sodium citrate bath in a pH of 6.5 and 003mol dm-3 DMAB concentration was the highest -5.41wt%-, while the C content was lower -01wt%-. The C content of film deposited from a diethylenetriamine bath at a pH 7.5 and the same DMAB concentration as given above was, in contrast, the highest -0.29wt%-, and the B content was lower -1.34wt%-. XRD results indicated that, in our study, as-deposited films showed an amorphous structure when the condition was such that the boron content was more than 2.5wt%. Such as-deposited films were crystallized by heat treatment at 300°C for 1hr. The lattice distance of Ni (111) was shifted from 0.2017nm to 0.2032nm, and the content of C was found to have increased.

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