高周波スパッタ法によるFe/AlN積層膜の作製と磁性 Preparation and Magnetism of Multilayered Fe/AlN Prepared by Rf-sputter Deposition

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抄録

Four kinds of Fe metal/A1N multilayered thin films were deposited by rf-sputter deposition at room temperature. Both Fe and AIN layers have almost the same thickness and their total film thikness was about 1u m. They have stacking sequences of 1, 3, 8 and 35 times, respectively. They showed an anisotropic magnetic behavior; soft ferromagnetic and mostly paramagnetic when a magnetic field was applied along and vertically against the film surface, respectively. Larger saturation magnetization in 10 to 20% than that of α-Fe was observed on the multilayers in the 3 and the 8 times stacking. Larger internal magnetic field component in about 10% than that of α-Fe was present in Mossbauer spectra for these films. Formation of both iron nitride and aluminum metal were detected at the interface of the multilayers by XAFS, Mössbauer spectrocopy and XPS even though the films were prepared at room temperature.

収録刊行物

  • 粉体および粉末冶金

    粉体および粉末冶金 43(12), 1420-1425, 1996-12-15

    Japan Society of Powder and Powder Metallurgy

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各種コード

  • NII論文ID(NAID)
    10002261178
  • NII書誌ID(NCID)
    AN00222724
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    05328799
  • NDL 記事登録ID
    4118677
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-274
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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