ヘリコンスパッタ法により作製したTiO_2/SiO_2多層膜の微細構造および光学特性 Optical and Structural Characterization of TiO_2/SiO_2 Multilayer Films Prepared by Helicon Plasma Sputtering
Alternating TiO<SUB>2</SUB>/SiO<SUB>2</SUB> multilayer optical films were fabricated on BK7 glass and Si (100) substrates by helicon plasma sputtering at room temperature. Optical and structural characterization of monolayers of TiO<SUB>2</SUB> and SiO<SUB>2</SUB> films, and their multilayers have been performed. The results of structural analysis show that the TiO<SUB>2</SUB> and SiO<SUB>2</SUB> films have a homogeneous and amorphous microstructure. Auger electron spectroscopy (AES) and transmission electron microscopy (TEM) observations reveal that TiO<SUB>2</SUB>/SiO<SUB>2</SUB> multilayer films have well-defined interface. Five layers of alternating TiO<SUB>2</SUB> and SiO<SUB>2</SUB> exhibit maximum reflectance of 87% around the central wavelength of 800 nm which agrees well with the theoretical result.
粉体および粉末冶金 46(2), 180-184, 1999-02-15
Japan Society of Powder and Powder Metallurgy