P,S,BおよびBiをイオン注入した純ニッケルの水素透過挙動

• 西村 六郎

  大阪府立大学工学部

• 山川 宏二

  大阪府立大学工学部

• Hubler G. K.

  U. S. Navel Research Laboratory

• Latanision R. M.

  The H. H. Uhlig Corrosion Laboratory, Massachusetts Institute of Technology

書誌事項

タイトル別名

• Hydrogen Permeation Behavior of Pure Nickel Implanted with P, S, B and Bi Elements
• P S B オヨビ Bi オ イオン チュウニュウシタ ジュン ニッケル ノ

抄録

The entry and transport of hydrogen in phos-phorous-, boron-, sulfur- and bismuth-implanted pure nickel specimens with a fluence range of 1×10¹⁵ to 1×10¹⁷/cm² have been investigated using an electrochemical permeation technique. The steady state permeation current density increases with increasing fluence for the implanted specimens except for sulfur-implanted specimens. The break-through time of the transient curves is found to depend largely upon fluence and implanting elements. In addition, a removal method for dissolving implanted layers using 0.2% HF solution is applied to investigating an effect of implanted elements themselves on hydrogen permeation transients. The results are explained by considering shallow and deep hydrogen traps, compressive stress, the change in phase structure of implanted layer and so on.

収録刊行物

• Ｚａｉｒｙｏ‐ｔｏ‐Ｋａｎｋｙｏ

  Ｚａｉｒｙｏ‐ｔｏ‐Ｋａｎｋｙｏ 45 (2), 75-82, 1996

  公益社団法人 腐食防食学会

キーワード

• ion implantation
• hydrogen permeation curve
• steady state permeation current
• phosphorus
• boron
• sulfur

詳細情報

• CRID: 1390282681236427392
• NII論文ID: 130004238487
• NII論文ID: 10002262583
• NII書誌ID: AN10235427
• DOI: 10.3323/jcorr1991.45.75
• COI: 1:CAS:528:DyaK28XhsF2jt7s%3D
• ISSN: 18819664
• ISSN: 09170480
• NDL書誌ID: 3926693
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I3926693
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