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- 藤田 大介
- 科学技術庁金属材料技術研究所
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- SHENG Hanyu
- National Research Institute for Metals
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- JIANG Qidu
- National Research Institute for Metals
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- DONG Zhenchao
- National Research Institute for Metals
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- 根城 均
- 科学技術庁金属材料技術研究所
書誌事項
- タイトル別名
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- Development of STM-based Nanofabrication and Measurement System for Nano Devices.
- STM ニヨル ナノ デバイス サクセイ ヒョウカ システム ノ カイハツ
この論文をさがす
抄録
We have developed a nanofabrication and measurement system for nano-devices such as single electron transistors. This system can perform all of the required processes in ultrahigh vacuum, such as preparation of substrate surface, fabrication of metallic electrodes on a substrate using a precise mask deposition equipment, nanofabrication of gold dots and lines using a scanning tunneling microscope (STM), and measurement of electric properties of the nano-devices using a low temperature four-contact probe apparatus. Using a novel atom transfer method from the gold tips, highly reproducible fabrication of gold nano-dots and nano-lines have been demonstrated here. Some technical innovations required for this development are briefly introduced.
収録刊行物
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- 表面科学
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表面科学 18 (8), 460-465, 1997
公益社団法人 日本表面科学会
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詳細情報
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- CRID
- 1390282681431769600
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- NII論文ID
- 10002264826
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- NII書誌ID
- AN00334149
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- COI
- 1:CAS:528:DyaK2sXmsF2rtbc%3D
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- ISSN
- 18814743
- 03885321
- http://id.crossref.org/issn/03885321
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- NDL書誌ID
- 4266098
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可