真空紫外光源とその応用　　真空紫外光プロセスの現状と将来

• 佐々木 亘

  宮崎大学工学部電気電子工学科

書誌事項

タイトル別名

• Vacuum-Ultraviolet Light Sources and Their Applications for Processings. A Review of the Present Status and Future Prospects on Materials Processing Using Vacuum-Ultraviolet Light.
• カイセツ シンクウ シガイコウ プロセス ノ ゲンジョウ ト ショウライ

抄録

Efficient and intense light sources in the vacuum-ultraviolet spectral region and their applications have been reviewed. High-intensity dielectric-barrier-discharge Ar, Kr and Xe excimer lamps were emphasized. Rare gas excimer lasers such as Ar₂, Kr₂ with electron beam excitations and discharge pumped F₂ lasers were briefly mentioned as coherent VUV light sources. Potentialities of ArKr hetero-eximer lasers were also discussed. Applications of VUV light to surface cleanings, SiO₂ thin films decompositions and compositions on Si wafers were reviewed.

収録刊行物

• 表面科学

  表面科学 20 (6), 388-392, 1999

  公益社団法人 日本表面科学会

詳細情報

• CRID: 1390282681432317184
• NII論文ID: 10002268091
• NII書誌ID: AN00334149
• DOI: 10.1380/jsssj.20.388
• ISSN: 18814743
• ISSN: 03885321
• NDL書誌ID: 4757707
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4757707
• Web Site: http://www.jstage.jst.go.jp/article/jsssj1980/20/6/20_6_388/_pdf
• 本文言語コード: ja
• データソース種別:
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• 抄録ライセンスフラグ: 使用不可