真空紫外光プロセスの現状と将来 A Review of the Present Status and Future Prospects on Materials Processing Using Vacuum-Ultraviolet Ligt

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著者

    • 佐々木 亘 SASAKI Wataru
    • 宮崎大学工学部電気電子工学科 Department of Electrical and Electronics Engineering, Faculty of Engineering, University of Miyazaki

抄録

Efficient and intense light sources in the vacuum-ultraviolet spectral region and their applications have been reviewed. High-intensity dielectric-barrier-discharge Ar, Kr and Xe excimer lamps were emphasized. Rare gas excimer lasers such as Ar<SUB>2</SUB>, Kr<SUB>2</SUB> with electron beam excitations and discharge pumped F<SUB>2</SUB> lasers were briefly mentioned as coherent VUV light sources. Potentialities of ArKr hetero-eximer lasers were also discussed. Applications of VUV light to surface cleanings, SiO<SUB>2</SUB> thin films decompositions and compositions on Si wafers were reviewed.

収録刊行物

  • 表面科学

    表面科学 20(6), 388-392, 1999-06-10

    The Surface Science Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002268091
  • NII書誌ID(NCID)
    AN00334149
  • 本文言語コード
    JPN
  • 資料種別
    REV
  • ISSN
    03885321
  • NDL 記事登録ID
    4757707
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z15-379
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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