真空紫外光プロセスの現状と将来 A Review of the Present Status and Future Prospects on Materials Processing Using Vacuum-Ultraviolet Ligt
Efficient and intense light sources in the vacuum-ultraviolet spectral region and their applications have been reviewed. High-intensity dielectric-barrier-discharge Ar, Kr and Xe excimer lamps were emphasized. Rare gas excimer lasers such as Ar<SUB>2</SUB>, Kr<SUB>2</SUB> with electron beam excitations and discharge pumped F<SUB>2</SUB> lasers were briefly mentioned as coherent VUV light sources. Potentialities of ArKr hetero-eximer lasers were also discussed. Applications of VUV light to surface cleanings, SiO<SUB>2</SUB> thin films decompositions and compositions on Si wafers were reviewed.
表面科学 20(6), 388-392, 1999-06-10
The Surface Science Society of Japan