真空紫外光プロセスの現状と将来 [in Japanese] A Review of the Present Status and Future Prospects on Materials Processing Using Vacuum-Ultraviolet Ligt [in Japanese]
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Efficient and intense light sources in the vacuum-ultraviolet spectral region and their applications have been reviewed. High-intensity dielectric-barrier-discharge Ar, Kr and Xe excimer lamps were emphasized. Rare gas excimer lasers such as Ar<SUB>2</SUB>, Kr<SUB>2</SUB> with electron beam excitations and discharge pumped F<SUB>2</SUB> lasers were briefly mentioned as coherent VUV light sources. Potentialities of ArKr hetero-eximer lasers were also discussed. Applications of VUV light to surface cleanings, SiO<SUB>2</SUB> thin films decompositions and compositions on Si wafers were reviewed.
- J. Surf. Sci. Soc. Jpn.
J. Surf. Sci. Soc. Jpn. 20(6), 388-392, 1999-06-10
The Surface Science Society of Japan