Vacuum-Ultraviolet Light Sources and Their Applications for Processings. A Review of the Present Status and Future Prospects on Materials Processing Using Vacuum-Ultraviolet Light.

  • SASAKI Wataru
    Department of Electrical and Electronics Engineering, Faculty of ngineering, University of Miyazaki

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Other Title
  • 真空紫外光源とその応用  真空紫外光プロセスの現状と将来
  • カイセツ シンクウ シガイコウ プロセス ノ ゲンジョウ ト ショウライ

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Abstract

Efficient and intense light sources in the vacuum-ultraviolet spectral region and their applications have been reviewed. High-intensity dielectric-barrier-discharge Ar, Kr and Xe excimer lamps were emphasized. Rare gas excimer lasers such as Ar2, Kr2 with electron beam excitations and discharge pumped F2 lasers were briefly mentioned as coherent VUV light sources. Potentialities of ArKr hetero-eximer lasers were also discussed. Applications of VUV light to surface cleanings, SiO2 thin films decompositions and compositions on Si wafers were reviewed.

Journal

  • Hyomen Kagaku

    Hyomen Kagaku 20 (6), 388-392, 1999

    The Surface Science Society of Japan

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