真空紫外光リソグラフィ VUV Lithography

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著者

    • 笹子 勝 SASAGO Masaru
    • 松下電子工業(株)プロセス開発センター ULSI Process Technology Development Center, Matsushita Electronics Corporation

抄録

The semiconductor industry, whose long period of sustained growth is in no small measure due to the optical lithography process, is now on the verge of a dilemma. Optical lithography has arrived at a crossroads, and after many years of steady improvement in device performance, device integration, and cost reduction, the industry is facing a major crisis. In Japan, Europe and the U.S., consortiums comprising the entries from government, business, and the academic world have been formed in an effort to ward off the coming crisis. Their work seeks to extend the useful life of optical lithography as well as to foster the development of post-optical lithographic processes. A particular problem they are confirming is to ascertain how the development of sub-0.1μm lithographic technology will affect the economical manufacturing of semiconductors. This paper discusses the limits of current optical lithography such as VUV lithography, especially F<SUB>2</SUB> excimer laser and worldwide trends in developing post-optical lithographic processes. Future miniaturization trends in semiconductor production are also discussed.

収録刊行物

  • 表面科学  

    表面科学 20(6), 421-428, 1999-06-10 

    The Surface Science Society of Japan

参考文献:  18件

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各種コード

  • NII論文ID(NAID)
    10002268217
  • NII書誌ID(NCID)
    AN00334149
  • 本文言語コード
    JPN
  • 資料種別
    REV
  • ISSN
    03885321
  • NDL 記事登録ID
    4757730
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z15-379
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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