A Standard Sample Preparation Method for the Determination of Metal Impurities on a Silicon Wafer by Total Reflection X-Ray Fluorescence Spectrometry
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- MORI Yoshihiro
- Electronics Research Laboratories, Nippon Steel Corporation, c/o NSC Electron Corporation
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- SHIMANOE Kengo
- Electronics Research Laboratories, Nippon Steel Corporation, c/o NSC Electron Corporation
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- SAKON Tadashi
- Advanced Materials and Technology Research Laboratories, Nippon Steel Corporation
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収録刊行物
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- Analytical sciences : the international journal of the Japan Society for Analytical Chemistry
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Analytical sciences : the international journal of the Japan Society for Analytical Chemistry 11 (3), 499-504, 1995-07-10
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詳細情報 詳細情報について
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- CRID
- 1570854174088768896
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- NII論文ID
- 10002405747
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- NII書誌ID
- AA10500785
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- ISSN
- 09106340
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- 本文言語コード
- en
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- データソース種別
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- CiNii Articles