A Standard Sample Preparation Method for the Determination of Metal Impurities on a Silicon Wafer by Total Reflection X-Ray Fluorescence Spectrometry

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著者

    • MORI Yoshihiro
    • Electronics Research Laboratories, Nippon Steel Corporation, c/o NSC Electron Corporation
    • SHIMANOE Kengo
    • Electronics Research Laboratories, Nippon Steel Corporation, c/o NSC Electron Corporation
    • SAKON Tadashi
    • Advanced Materials and Technology Research Laboratories, Nippon Steel Corporation

収録刊行物

  • Analytical sciences : the international journal of the Japan Society for Analytical Chemistry

    Analytical sciences : the international journal of the Japan Society for Analytical Chemistry 11(3), 499-504, 1995-07-10

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各種コード

  • NII論文ID(NAID)
    10002405747
  • NII書誌ID(NCID)
    AA10500785
  • 本文言語コード
    ENG
  • 資料種別
    ART
  • ISSN
    09106340
  • データ提供元
    CJP書誌  CJP引用 
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