A Standard Sample Preparation Method for the Determination of Metal Impurities on a Silicon Wafer by Total Reflection X-Ray Fluorescence Spectrometry

• MORI Yoshihiro

  Electronics Research Laboratories, Nippon Steel Corporation, c/o NSC Electron Corporation

• SHIMANOE Kengo

  Electronics Research Laboratories, Nippon Steel Corporation, c/o NSC Electron Corporation

• SAKON Tadashi

  Advanced Materials and Technology Research Laboratories, Nippon Steel Corporation

Journal

• Anal. Sci.

  Anal. Sci. 11 (3), 499-504, 1995-07-10

Keywords

• Total reflection X-ray fluorescence spectrometry (TXRF)
• standard sample
• silicon water
• contamination
• transition metal

Details

• CRID: 1570854174088768896
• NII Article ID: 10002405747
• NII Book ID: AA10500785
• ISSN: 09106340
• Text Lang: en
• Data Source:
  • CiNii Articles