A Review of Standardization Issues for Total Reflection X-Ray Fluorescence and Vapor Phase Decomposition/Total Reflection X-Ray Fluorescence

• HOCKETT Richard S.

  Charles Evans & Associates

Journal

• Analytical sciences : the international journal of the Japan Society for Analytical Chemistry

  Analytical sciences : the international journal of the Japan Society for Analytical Chemistry 11 (3), 511-513, 1995-07-10

Keywords

• TXRF
• VPD
• standards
• quantification
• silicon
• surface

Details

• CRID: 1572543023949032576
• NII Article ID: 10002405770
• NII Book ID: AA10500785
• ISSN: 09106340
• Text Lang: en
• Data Source:
  • CiNii Articles