High-Sensitivity Total Reflection X-Ray Fluorescence Spectroscopy of Silicon Wafers Using Synchrotron Radiation

• LADERMAN Stephen S.

  Hewlett-Packard Laboratories, Hewlett-Packard Company

• FISCHER-COLBRIE Alice

  Hewlett-Packard Laboratories, Hewlett-Packard Company

• SHIMAZAKI Ayako

  Integrated Circuit Advanced Process Engineering Department, Toshiba Corporation

• MIYAZAKI Kunihiro

  Integrated Circuit Advanced Process Engineering Department, Toshiba Corporation

• BRENNAN Sean

  Stanford Synchrotron Radiation Laboratory, Stanford Linear Accelerator Center

• TAKAKURA Noritaka

  Stanford Synchrotron Radiation Laboratory, Stanford Linear Accelerator Center

• PIANETTA Piero

  Stanford Synchrotron Radiation Laboratory, Stanford Linear Accelerator Center

• KORTRIGHT Jeffrey B.

  Center for X-ray Optics, Lawrence Berkeley Laboratory, University of California

収録刊行物

• Analytical sciences : the international journal of the Japan Society for Analytical Chemistry

  Analytical sciences : the international journal of the Japan Society for Analytical Chemistry 11 (3), 515-518, 1995-07-10

キーワード

• Total reflection X-ray fluorescence(TXRF, TRXRF)
• synchrotron radiation
• silicon
• VLSI
• ULSI
• wafer cleaning
• microcontamination
• synthetic multilayer
• multilayer X-ray monochromator

詳細情報

• CRID: 1573105973902402048
• NII論文ID: 10002405804
• NII書誌ID: AA10500785
• ISSN: 09106340
• 本文言語コード: en
• データソース種別:
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