Standard Sample Preparation for the Analysis of Several Metals on Silicon Wafer

• MORI Yoshihiro

  Advanced Materials and Technology Research Laboratories, Nippon Steel Corporation, c/o NSC Electron Corporation

• SHIMANOE Kengo

  Advanced Materials and Technology Research Laboratories, Nippon Steel Corporation, c/o NSC Electron Corporation

Journal

• Analytical sciences : the international journal of the Japan Society for Analytical Chemistry

  Analytical sciences : the international journal of the Japan Society for Analytical Chemistry 12 (1), 141-143, 1996-02-10

Keywords

• Total reflection X-ray fluorescence spectrometry
• standard sample
• silicon wafer
• contamination
• transition metal
• SC-1

Details

• CRID: 1570291224135380864
• NII Article ID: 10002407683
• NII Book ID: AA10500785
• ISSN: 09106340
• Text Lang: en
• Data Source:
  • CiNii Articles