酸化物薄膜表面の水に対するぬれ性と摩擦係数 Wettability and Friction Coefficient of the Oxide Thin Film Surface

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We sputter-deposited oxide thin films such as Y<sub>2</sub>O<sub>3</sub>, SiO<sub>2</sub>, TiO<sub>2</sub>, Ta<sub>2</sub>O<sub>5</sub>, CeO<sub>2</sub>, and MoO<sub>3</sub> and studied water droplet wettability and the surface friction coefficient under the controlled conditions of 20-25°C and 50-60% RH. Water droplet wettability was evaluated by measuring the contact angle. We found that the angle increased and saturated over time for all tested oxide thin films and that contact angle saturation depended on the type of oxide thin films used. The relationship between the contact angle and <i>r/Z</i> (ion radius divided by cation charge) suggests that the oxide surface structure affects adsorption states. We also found that the thin film surface friction coefficient also decreased over time in line with variations in the contact angle. The correspondence between the friction coefficient and adhesion derived from the contact angle means that friction originates in adhesive force.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan  

    表面技術 = The Journal of the Surface Finishing Society of Japan 49(2), 191-194, 1998-02-01 

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002446167
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    4392720
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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