Non-stoichiometry and Antiferromagnetic Phase Transition of NaCl-type CrN Thin Films Prepared by Reactive Sputtering

• TSUCHIYA Yasuaki

  Department of Chemistry, Faculty of Science, Kyoto University

• KOSUGE Koji

  Department of Chemistry, Faculty of Science, Kyoto University

• IKEDA Yasukuni

  Institute for Chemical Research, Kyoto University

• SHIGEMATSU Toshihiko

  Department of Chemistry, Faculty of Science, Konan University

• YAMAGUCHI Sadaei

  Institute for Materials Research, Tohoku University

• NAKAYAMA Noriaki

  Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University

Journal

• Materials transactions, JIM

  Materials transactions, JIM 37 (2), 121-129, 1996-02

Keywords

• chromium nitride
• thin films
• non-stoichiometry
• reactive sputtering
• X-ray diffraction
• X-ray photoelectron spectroscopy
• Rutherford back scattering spectrometry
• antiferromagnetic phase transition
• electrical resistivity

Details

• CRID: 1573105973903172480
• NII Article ID: 10002446751
• NII Book ID: AA10699969
• ISSN: 09161821
• Text Lang: en
• Data Source:
  • CiNii Articles