Effect of Nb-Ion Implantation on the Oxidation Resistance of TiAl
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- TANIGUCHI Shigeji
- Department of Materials Science and Processing, Faculty of Engineering, Osaka University
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- SHIBATA Toshio
- Department of Materials Science and Processing, Faculty of Engineering, Osaka University
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- SAEKI Takehiko
- Department of Materials Science and Processing, Faculty of Engineering, Osaka University
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- ZANG Huixing
- The Institute of Low Energy Nuclear Physics, Beijing Normal University
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- LIU Xianghuai
- Ion Beam Laboratory, Shanghai Institute of Metallurgy, The Chinese Academy of Sciences
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収録刊行物
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- Materials transactions, JIM
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Materials transactions, JIM 37 (5), 998-1003, 1996-05
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詳細情報 詳細情報について
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- CRID
- 1574231873810027136
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- NII論文ID
- 10002449182
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- NII書誌ID
- AA10699969
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- ISSN
- 09161821
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- 本文言語コード
- en
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- データソース種別
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- CiNii Articles