A New Method for Cleaning the Surface of Ultra High-Purity Iron by High-Purity Ozone Exposure and UV Irradiation
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- Suzuki Shigeru
- Institute for Advanced Materials Processing, Tohoku University
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- Ichimura Shingo
- Electrotechnical Laboratory
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- Kurokawa Akira
- Electrotechnical Laboratory
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- Ishikawa Yukio
- Institute for Advanced Materials Processing, Tohoku University
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- Isshiki Minoru
- Institute for Advanced Materials Processing, Tohoku University
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- Waseda Yoshio
- Institute for Advanced Materials Processing, Tohoku University
書誌事項
- タイトル別名
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- New Method for Cleaning the Surface of
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抄録
A new method by applying high-purity ozone exposure and ultraviolet (UV) irradiation has been used for cleaning the surface of ultra high-purity iron with a carbon contaminated layer. The amount and chemical state of elements on the specimen surface were characterized by X-ray photoelectron spectroscopy. The intensity of the C 1s XPS peak due to carbon contamination was found to decrease with increasing ozone exposure at room temperature. UV irradiation during ozone exposure enhanced the cleaning rate. The XPS results show that contaminated carbon is mainly classified into major aliphatic carbon and minor carboxyl carbon, and their ratio depends upon the condition of ozone exposure. The role of ozone exposure and UV irradiation was discussed with respect to surface cleaning.
収録刊行物
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- Materials Transactions, JIM
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Materials Transactions, JIM 38 (5), 451-456, 1997
社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390001204245511936
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- NII論文ID
- 130003556924
- 10002452640
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- NII書誌ID
- AA10699969
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- COI
- 1:CAS:528:DyaK2sXkt1aqur0%3D
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- ISSN
- 2432471X
- 09161821
- http://id.crossref.org/issn/09161821
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- NDL書誌ID
- 4231134
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可