Copper Purification by Anion-Exchange Separation in Chloride Media

• Uchikoshi Masahito

  Institute for Advanced Materials Processing, Tohoku University

• Kékesi Tamás

  Institute for Advanced Materials Processing, Tohoku University

• Ishikawa Yukio

  Institute for Advanced Materials Processing, Tohoku University

• Mimura Kouji

  Institute for Advanced Materials Processing, Tohoku University

• Isshiki Minoru

  Institute for Advanced Materials Processing, Tohoku University

書誌事項

タイトル別名

• Copper Purification by Anion-Exchange S

抄録

Anion-exchange separation in chloride media is applied for the preparation of high purity copper. Oxygen free copper (OFC) which has a residual resistivity ratio of 190 is used as a starting material. Copper refined by the purification process based on the anion-exchange separation shows residual resistivity ratio of 2300 which is much larger than that of the starting material. Glow discharge mass spectrometry analysis shows that almost all impurities are effectively removed by the purification process. High purity copper is successfully obtained by the purification process based on the anion exchange separation.

収録刊行物

• Materials Transactions, JIM

  Materials Transactions, JIM 38 (12), 1083-1088, 1997

  社団法人 日本金属学会

キーワード

• high purity copper
• anion-exchange separation
• hydrogen reduction
• residual resistivity ratio

詳細情報

• CRID: 1390282679224024576
• NII論文ID: 130003422498
• NII論文ID: 10002454501
• NII書誌ID: AA10699969
• DOI: 10.2320/matertrans1989.38.1083
• COI: 1:CAS:528:DyaK1cXht1ymtL4%3D
• ISSN: 2432471X
• ISSN: 09161821
• NDL書誌ID: 4384538
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4384538
• Web Site: https://www.jstage.jst.go.jp/article/matertrans1989/38/12/38_12_1083/_pdf
• 本文言語コード: en
• データソース種別:
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  • NDL
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  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可