AFM Study on Morphology Evolution of Zinc Electrodeposits

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Nano-size growth of zinc electrodeposit is studied by using atomic force microscopy (AFM). The (0001)<sub>η</sub> and {1010}<sub>η</sub> of hexagonal plate crystals are aligned parallel to the steel substrate with Sn<sup>++</sup> as additive. An AFM cantilever is placed on these planes in order to focus the nano-size growth image on these planes.<br> The (0001)<sub>η</sub> consists of both 30 nm of granular crystals and alignments of these granular crystals, <i>i.e.</i> steps. These steps grow laterally as a result of the embedment of zinc ion clusters to the kinks of steps. The {1010}<sub>η</sub> and initial deposit also consist of these granular crystals.<br> The initial zinc deposits are made up of the edges of hexagonal platelet crystals oriented ten to twenty degree from the substrate. The (0001)<sub>η</sub> of hexagonal platelet crystals becomes parallel to the substrate as the deposit grows with Sn<sup>++</sup> as additive. The {1010}<sub>η</sub>, on the other hand, becomes parallel to the substrate without Sn<sup>++</sup> as additive. These changes in the texture are caused by the locations of nucleation sites of the steps on the (0001)<sub>η</sub>.

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  • ISIJ international

    ISIJ international 37(2), 140-145, 1997-02-15

    The Iron and Steel Institute of Japan

参考文献:  21件中 1-21件 を表示

  • <no title>

    TANAKA A.

    Bull. Iron Steel Inst. Jpn. 1, 101, 1996

    被引用文献1件

  • <no title>

    KONDO K.

    Doctor Thesis, Kyoto University, 1994

    被引用文献2件

  • <no title>

    KONDO K.

    J. Appl. Electrochem. 18, 154, 1988

    被引用文献3件

  • <no title>

    KONDO K.

    Hyoumen-gijitu-Kyoukaishi 43, 156, 1992

    被引用文献1件

  • <no title>

    KONDO K.

    Kagaku-Kougaku 10, 773, 1994

    被引用文献2件

  • <no title>

    KONDO K.

    Tetsu-to-Hagane 76, 592, 1990

    被引用文献2件

  • <no title>

    KONDO K.

    ISIJ Int. 30, 464, 1990

    被引用文献3件

  • <no title>

    KONDO K.

    J. Electrochem. Soc. 142, 2256, 1995

    被引用文献3件

  • <no title>

    KONDO K.

    Tetsu-to-Hagane 74, 2300, 1988

    被引用文献4件

  • <no title>

    KONDO K.

    ISIJ Int. 29, 517, 1989

    被引用文献4件

  • <no title>

    KONDO K.

    Tetsu-to-Hagane 77, 886, 1991

    被引用文献5件

  • <no title>

    KONDO K.

    J. Electrochem. Soc. 142, L193, 1995

    被引用文献2件

  • <no title>

    KONDO K.

    J. Electrochem. Soc. 143, L75, 1996

    被引用文献4件

  • Proc. of the Electrochemical Soc.

    PARK H.

    Second Symp. on Electrochemically Deposited Thin Films II, 1994

    被引用文献1件

  • <no title>

    HARRIS S. J.

    The Electrochemical Soc. Extended Abstract 570, 1995

    被引用文献1件

  • <no title>

    KAMEI K.

    J. Appl. Electrochem. 17, 821, 1987

    被引用文献11件

  • <no title>

    KAMEI K.

    J. Jpn. Inst. Met. 52, 743, 1988

    被引用文献1件

  • <no title>

    OHMORI Y.

    ISIJ Int. 33, 1196, 1993

    被引用文献9件

  • <no title>

    OHTSUBO H.

    ISIJ Int. 34, 1002, 1994

    被引用文献9件

  • <no title>

    NAKAI K.

    Mtere 12, 1467, 1994

    被引用文献1件

  • <no title>

    KUROSAKI M.

    CAMP-ISIJ 8, 1419, 1995

    被引用文献3件

被引用文献:  5件中 1-5件 を表示

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