Rupture Phenomena of Molten Na_2O・2SiO_2 Thin Films

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著者

    • KURANAGA Taichi
    • Division of Materials Science and Engineering, Graduate School of Engineering, Hokkaido University
    • SAKAKI Yasushi
    • Division of Materials Science and Engineering, Graduate School of Engineering, Hokkaido University
    • KASHIWAYA Yoshiaki
    • Division of Materials Science and Engineering, Graduate School of Engineering, Hokkaido University
    • ISHII Kuniyoshi
    • Division of Materials Science and Engineering, Graduate School of Engineering, Hokkaido University

抄録

A thin film drawn-out technique was developed to investigate the rupture mechanism of molten sodium silicate thin films. The rupture length of molten sodium silicate films was measured as a function of temperature and the drawn-out rate. It was found that the rupture thickness, <I>T</I>, was dependent on the drawn-out rate, <I>v</I>, at high drawn out rate, being proportional to the 2/3rd of <I>v, i.e.</I>, <br><br><I>T</I> oc (<I>v</I>)<sup>2/3</sup><br><br>At low drawn-out rate the rupture thickness was found to be independent from <I>v</I> below a critical value <I>v</I><sub>c</sub>. <br>It was concluded that the rupture at high drawn-out rate was controlled by the external drawn-out rate of the molten slag and the constant rupture thickness at the low drawn-out rate might be determined by the Plateau border suction flow.

収録刊行物

  • ISIJ international  

    ISIJ international 39(6), 548-552, 1999-06-15 

    The Iron and Steel Institute of Japan

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