Rupture Phenomena of Molten Na2O2SiO2 hin Films.

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  • Kuranaga Taichi
    Division of Materials Science and Engineering, Graduate School of Engineering, Hokkaido University
  • Sasaki Yasushi
    Division of Materials Science and Engineering, Graduate School of Engineering, Hokkaido University
  • Kashiwaya Yoshiaki
    Division of Materials Science and Engineering, Graduate School of Engineering, Hokkaido University
  • Ishii Kuniyoshi
    Division of Materials Science and Engineering, Graduate School of Engineering, Hokkaido University

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A thin film drawn-out technique was developed to investigate the rupture mechanism of molten sodium silicate thin films. The rupture length of molten sodium silicate films was measured as a function of temperature and the drawn-out rate. It was found that the rupture thickness, T, was dependent on the drawn-out rate, v, at high drawn out rate, being proportional to the 2/3rd of v, i.e., <br><br>T oc (v)2/3<br><br>At low drawn-out rate the rupture thickness was found to be independent from v below a critical value vc. <br>It was concluded that the rupture at high drawn-out rate was controlled by the external drawn-out rate of the molten slag and the constant rupture thickness at the low drawn-out rate might be determined by the Plateau border suction flow.

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