配列粒子の被膜形成による基板上への固定 Fixing of Arranged Particles on Substrates by Coating Method

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Silica particles of 5μmφ were arranged on CaTiO3 substrates by the drawing and the developing steps, as reported in a previous paper. Fixing treatment is necessary to repeat the arranging process to produce the three-dimensional micro-structures. A thin film of fluoride polymer was formed on the substrates after the particle arrangement to fix the arranged particles. The effects of the fixing treatment on the arranged particles and the arranging process were investigated. The following results were obtained. (1) Electrified patterns are formed on the substrates with an electron beam scanning in the drawing step. More sharp patterns are obtained by preforming the thin film of fluoride polymer on the substrates. This improvement is due to suppression of surface diffusion of the electrified charges by the film. (2) The particles are arranged by the electrostatic force in the developing step. Since the electrified pattern is sharp, better particle arrangement can be obtained by preforming the film on the substrates. (3) The film holds the adhered particles through the second time drawing and developing steps and the arranged particles are scarcely affected by the fixing treatment. These results suggest that the formation of thin film of fluoride polymer is effective for the fixing treatment and that three-dimensional micro-structures can be produced by the particle assemblage

収録刊行物

  • 資源と素材 : 資源・素材学会誌 : journal of the Mining and Materials Processing Institute of Japan  

    資源と素材 : 資源・素材学会誌 : journal of the Mining and Materials Processing Institute of Japan 114(2), 133-138, 1998-02-25 

    The Mining and Materials Processing Institute of Japan

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各種コード

  • NII論文ID(NAID)
    10002467200
  • NII書誌ID(NCID)
    AN10062646
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09161740
  • NDL 記事登録ID
    4424602
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-315
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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