r. f. スパッタリング法による酸化物薄膜のモル成膜速度とその形態 Molar Deposition Rate and Morphology of Oxide Thin Film Using r. f. Sputtering

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Thin films were prepared by r. f. sputtering using 21 kinds of oxides as target. The molar deposition rate and morphology of sputtered oxide films were measured on the basis of SEM and XRD. The factors which decided the molar deposition rate of sputtered oxide films were discussed in terms of the momentum transfer process, the thermal evaporation process, and the crystal structure of oxide. As a result, we classified the oxides in (�) Coulomb's force (binding energy) dependence type, (�) vapor pressure dependence type, and (�) Madelung constant dominant type. We classified the morphology of sputtered thin films in (�) amorphous-, (�) amorphous + crystal-, and (�) crystal-non-decomposition type, and (�) amorphous-, (�) crystal-, and (�) crystal + sub oxide formation-decomposition type.

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  • 資源と素材 : 資源・素材学会誌 : journal of the Mining and Materials Processing Institute of Japan  

    資源と素材 : 資源・素材学会誌 : journal of the Mining and Materials Processing Institute of Japan 114(6), 437-440, 1998-06-25 

    The Mining and Materials Processing Institute of Japan

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各種コード

  • NII論文ID(NAID)
    10002467646
  • NII書誌ID(NCID)
    AN10062646
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09161740
  • NDL 記事登録ID
    4512276
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-315
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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