r. f. スパッタリング法による酸化物薄膜のモル成膜速度とその形態 [in Japanese] Molar Deposition Rate and Morphology of Oxide Thin Film Using r. f. Sputtering [in Japanese]
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Thin films were prepared by r. f. sputtering using 21 kinds of oxides as target. The molar deposition rate and morphology of sputtered oxide films were measured on the basis of SEM and XRD. The factors which decided the molar deposition rate of sputtered oxide films were discussed in terms of the momentum transfer process, the thermal evaporation process, and the crystal structure of oxide. As a result, we classified the oxides in (�) Coulomb's force (binding energy) dependence type, (�) vapor pressure dependence type, and (�) Madelung constant dominant type. We classified the morphology of sputtered thin films in (�) amorphous-, (�) amorphous + crystal-, and (�) crystal-non-decomposition type, and (�) amorphous-, (�) crystal-, and (�) crystal + sub oxide formation-decomposition type.
- Journal of MMIJ
Journal of MMIJ 114(6), 437-440, 1998-06-25
The Mining and Materials Processing Institute of Japan