Molar Deposition Rate and Morphology of Oxide Thin Film Using r.f. Sputtering.

• MASUDA Hirohisa

  Graduate School of Engineering Sciences, Kyushu University

• TASHIRO Hirofumi

  Graduate Student, Kyushu University

• MURATA Takahiro

  Graduate Student, Kyushu University

• MORINAGA Kenji

  Graduate School of Engineering Sciences, Kyushu University, Kasuga–shi, Fukuoka 816–8580

Bibliographic Information

Other Title

• ｒ．ｆ．スパッタリング法による酸化物薄膜のモル成膜速度とその形態
• r.f.スパッタリングホウ ニヨル サンカブツ ハクマク ノ モル セイマク

Abstract

Thin films were prepared by r. f. sputtering using 21 kinds of oxides as target. The molar deposition rate and morphology of sputtered oxide films were measured on the basis of SEM and XRD. The factors which decided the molar deposition rate of sputtered oxide films were discussed in terms of the momentum transfer process, the thermal evaporation process, and the crystal structure of oxide. As a result, we classified the oxides in (�) Coulomb's force (binding energy) dependence type, (�) vapor pressure dependence type, and (�) Madelung constant dominant type. We classified the morphology of sputtered thin films in (�) amorphous-, (�) amorphous + crystal-, and (�) crystal-non-decomposition type, and (�) amorphous-, (�) crystal-, and (�) crystal + sub oxide formation-decomposition type.

Journal

• Shigen-to-Sozai

  Shigen-to-Sozai 114 (6), 437-440, 1998

  The Mining and Materials Processing Institute of Japan

Keywords

• Sputtering
• Oxide
• Thin Film
• Madelung Constant
• Molar Deposition Rate

Details

• CRID: 1390282680994190976
• NII Article ID: 10002467646
• NII Book ID: AN10062646
• DOI: 10.2473/shigentosozai.114.437
• COI: 1:CAS:528:DyaK1cXktlylsbk%3D
• ISSN: 18806244
• ISSN: 09161740
• NDL BIB ID: 4512276
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4512276
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed