シリコン膜で表面を被覆したステンレス鋼のガス放出特性 Outgassing Properties of Stainless Steel Covered with Si Film by Electron Beam Deposition

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抄録

By Si film coating on stainless steel by radio frequency (RF) magnetron sputtering we have developed very low outgassing state where the outgassing rate of Si coated sample is one tenth of the uncoated electrolytically polished stainless steel sample. As a preliminary step to find other coating techniques for an inner wall of vacuum chamber, electron beam deposition was examined by small samples in this paper. Outgassing properties of small samples were measured by thermal desorption spectroscopy (TDS). The outgassing depends on the film structure that was determined by deposition angle. When a Si film was deposited at low incident angle, the film was dense and the outgassing rate was as low as a Si film deposited by sputtering, whereas the outgassing rate of a Si film deposited at large incident angle was larger than that of uncoated stainless steel.

収録刊行物

  • 真空  

    真空 42(3), 139-142, 1999-03 

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002476161
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    4714007
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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