組成傾斜構造とAr圧がZrN/Zr/ZrO_2とZrN/ZrO_2膜の硬さ及び付着力に与える影響 Hardness and Adhesion Strength Enhancement by Compositional Gradient Structure and Optimization of Ar Partial Pressure for ZrN/Zr/ZrO_2 and ZrN/ZrO_2 Films Deposited by Reactive Sputtering

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Effects of compositionally gradient structure and discharge gas pressure on microhardness and adhesion of ZrN/Zr/ ZrO<SUB>2</SUB>/substrate and ZrN/ZrO<SUB>2</SUB>/substrate films have been studied. The apparatus used to deposit the films was an UHV-type sputtering machine with a Zr magnetron cathode. The compositional graduation of the films was formed by changing reactive gas flow rate gradually for a constant discharge current in the reactive sputtering. For film prepared, microhardness and adhesion strength were examined. The highest hardness was achieved for a ZrN/ZrO<SUB>2</SUB> film with a gradient interlayer deposited at an Ar partial pressure of 0.4 Pa. The ZrN/ZrO<SUB>2</SUB> or ZrN/Zr/ZrO<SUB>2</SUB> films with interrupted interfaces showed lower microhardnesses compared to the films with gradient interfaces. Although the adhesion strength increased as Ar partial pressure increased, the microhardness decreased. Thus, it was concluded from the experimental results obtained that the ZrN/ZrO<SUB>2</SUB> films with gradient interfaces deposited at a low Ar pressure yielded a high performance as a hard coating.

収録刊行物

  • 真空  

    真空 42(3), 167-170, 1999-03 

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002476213
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    4714254
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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