組成傾斜構造とAr圧がZrN/Zr/ZrO_2とZrN/ZrO_2膜の硬さ及び付着力に与える影響 Hardness and Adhesion Strength Enhancement by Compositional Gradient Structure and Optimization of Ar Partial Pressure for ZrN/Zr/ZrO_2 and ZrN/ZrO_2 Films Deposited by Reactive Sputtering
Effects of compositionally gradient structure and discharge gas pressure on microhardness and adhesion of ZrN/Zr/ ZrO<SUB>2</SUB>/substrate and ZrN/ZrO<SUB>2</SUB>/substrate films have been studied. The apparatus used to deposit the films was an UHV-type sputtering machine with a Zr magnetron cathode. The compositional graduation of the films was formed by changing reactive gas flow rate gradually for a constant discharge current in the reactive sputtering. For film prepared, microhardness and adhesion strength were examined. The highest hardness was achieved for a ZrN/ZrO<SUB>2</SUB> film with a gradient interlayer deposited at an Ar partial pressure of 0.4 Pa. The ZrN/ZrO<SUB>2</SUB> or ZrN/Zr/ZrO<SUB>2</SUB> films with interrupted interfaces showed lower microhardnesses compared to the films with gradient interfaces. Although the adhesion strength increased as Ar partial pressure increased, the microhardness decreased. Thus, it was concluded from the experimental results obtained that the ZrN/ZrO<SUB>2</SUB> films with gradient interfaces deposited at a low Ar pressure yielded a high performance as a hard coating.
真空 42(3), 167-170, 1999-03
The Vacuum Society of Japan