レーザアブレーション法を用いたLiNbO_3薄膜の作製 LiNbO_3 Thin Film Prepared by Pulsed Laser Deposition
A LiNbO<SUB>3</SUB> thin film was successfully fabricated onto a sapphire (001) substrate using pulsed laser deposition. The film quality was largely affected by substrate temperature, oxygen gas pressure, laser fluence and laser repetition frequency. By adjusting these conditions, a highly c-axis oriented LiNbO<SUB>3</SUB> film was obtained. The ordinary refractive index of the film became 2.28 at 632.8 nm of wavelength, which coincided with that of a LiNbO<SUB>3</SUB> single crystal. RHEED observation showed the film had twin boundaries. Further improvements are now undergoing.
真空 42(3), 261-264, 1999-03
The Vacuum Society of Japan