レーザアブレーション法を用いたLiNbO_3薄膜の作製 LiNbO_3 Thin Film Prepared by Pulsed Laser Deposition

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抄録

A LiNbO<SUB>3</SUB> thin film was successfully fabricated onto a sapphire (001) substrate using pulsed laser deposition. The film quality was largely affected by substrate temperature, oxygen gas pressure, laser fluence and laser repetition frequency. By adjusting these conditions, a highly c-axis oriented LiNbO<SUB>3</SUB> film was obtained. The ordinary refractive index of the film became 2.28 at 632.8 nm of wavelength, which coincided with that of a LiNbO<SUB>3</SUB> single crystal. RHEED observation showed the film had twin boundaries. Further improvements are now undergoing.

収録刊行物

  • 真空

    真空 42(3), 261-264, 1999-03

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002476415
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    4714965
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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