イオンプレーティング法によるセラミックスTiN/CrN積層薄膜の合成と評価 Synthesis and Characterization of Ceramics TiN/CrN Multi-layer Thin Films by Arc Ion Plating
TiN/CrN multi-layer thin films were deposited on type 306 stainless steel and silicon substrate using an arc ion plating system. The structures of multi-layer thin films were controlled by TiN and CrN deposition time and the arc current. The multi-layer thin films were evaluated with x-ray diffraction and micro-hardness test. The results obtained are as follows : The hardness of deposited multi-layer thin films indicated a maximum value by changing the layer thickness and multi-layer period. The maximum knoop hardness of TiN/CrN multi-layer was found to be about 4, 000 Kg/mm<SUP>2</SUP>. This value was about 1.8 times larger than that of the TiN single layer. The enhancement mechanisms of hardness are discussed.
真空 42(3), 265-268, 1999-03
The Vacuum Society of Japan