イオンプレーティング法によるセラミックスTiN/CrN積層薄膜の合成と評価 Synthesis and Characterization of Ceramics TiN/CrN Multi-layer Thin Films by Arc Ion Plating

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TiN/CrN multi-layer thin films were deposited on type 306 stainless steel and silicon substrate using an arc ion plating system. The structures of multi-layer thin films were controlled by TiN and CrN deposition time and the arc current. The multi-layer thin films were evaluated with x-ray diffraction and micro-hardness test. The results obtained are as follows : The hardness of deposited multi-layer thin films indicated a maximum value by changing the layer thickness and multi-layer period. The maximum knoop hardness of TiN/CrN multi-layer was found to be about 4, 000 Kg/mm<SUP>2</SUP>. This value was about 1.8 times larger than that of the TiN single layer. The enhancement mechanisms of hardness are discussed.

収録刊行物

  • 真空

    真空 42(3), 265-268, 1999-03

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002476423
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    4714987
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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