Synthesis and Characterization of Ceramics TiN/CrN Multi-layer Thin Films by Arc Ion Plating.

• TAMAOKA Katsuyasu

  Faculty of Science and Technology, Ryukoku University

• ENOKI Koichi

  Faculty of Science and Technology, Ryukoku University

• AOI Yoshifumi

  Faculty of Science and Technology, Ryukoku University

• KAMIJO Eiji

  Faculty of Science and Technology, Ryukoku University

Bibliographic Information

Other Title

• イオンプレーティング法によるセラミックスＴｉＮ／ＣｒＮ積層薄膜の合成と評価
• イオンプレーティングホウ ニ ヨル セラミックス TiN CrN セキソウ ハクマク ノ ゴウセイ ト ヒョウカ

Abstract

TiN/CrN multi-layer thin films were deposited on type 306 stainless steel and silicon substrate using an arc ion plating system. The structures of multi-layer thin films were controlled by TiN and CrN deposition time and the arc current. The multi-layer thin films were evaluated with x-ray diffraction and micro-hardness test. The results obtained are as follows : The hardness of deposited multi-layer thin films indicated a maximum value by changing the layer thickness and multi-layer period. The maximum knoop hardness of TiN/CrN multi-layer was found to be about 4, 000 Kg/mm². This value was about 1.8 times larger than that of the TiN single layer. The enhancement mechanisms of hardness are discussed.

Journal

• Shinku

  Shinku 42 (3), 265-268, 1999

  The Vacuum Society of Japan

Keywords

• Electrical and Electronic Engineering
• Surfaces, Coatings and Films
• Condensed Matter Physics

Details

• CRID: 1390282679040470528
• NII Article ID: 10002476423
• NII Book ID: AN00119871
• DOI: 10.3131/jvsj.42.265
• ISSN: 18809413
• ISSN: 05598516
• NDL BIB ID: 4714987
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4714987
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed