フリーマン型スパッターイオン源の開発とその製膜への応用 [in Japanese] Development of Freeman Type Sputter Ion Source and Application for Coatings [in Japanese]
Access this Article
Search this Article
A low-energy ion beam deposition apparatus with a Freeman type sputter ion source was developed. It is useful to investigate the process of thin film formation under deposition of ions with a well-defined energy. Energy distributions of Ti<SUP>+</SUP>, Fe<SUP>+</SUP>, C<SUP>+</SUP> ions were measured so that we estimated characteristics of the ion source. A titanium thin film produced in this apparatus is examined by means of elastic recoil detection analysis (ERDA) and X-ray diffraction (XRD).
- Journal of the Vacuum Society of Japan
Journal of the Vacuum Society of Japan 42(3), 341-344, 1999-03
The Vacuum Society of Japan