球状粉体への負イオン注入による均一性評価と注入原子の深さ方向分布 Evaluation of Uniformity and Depth Profiles in Negative-Ion Implantation into Spherical Powders

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The depth profile of implanted atoms in a spherical powder particle and the uniformity among particles were studied in negative-copper implantation into agitated powder particles. Negative-ion implantation into powder is a non-scattering technique for surface modification. In order to implant atoms to whole surface of each particles, we used an electromagnetic vibrator at frequency of 120 Hz as an agitator. Cu<SUP>-</SUP> ions were implanted at 70 and 40 keV with 1.1 × 10<SUP>16</SUP> ions/cm<SUP>2</SUP> into an agitated spherical glass powder and flat glass plate. From XPS analysis, the uniformity of implanted atoms among particles was found to be considerably good even in the simple agitation. The peak depth of Cu atoms in a spherical particle was found to be shallower that in the flat plate from both SIMS measurement and theoretical calculation.

収録刊行物

  • 真空  

    真空 42(3), 345-348, 1999-03 

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002476571
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    4716325
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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