球状粉体への負イオン注入による均一性評価と注入原子の深さ方向分布 [in Japanese] Evaluation of Uniformity and Depth Profiles in Negative-Ion Implantation into Spherical Powders [in Japanese]
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The depth profile of implanted atoms in a spherical powder particle and the uniformity among particles were studied in negative-copper implantation into agitated powder particles. Negative-ion implantation into powder is a non-scattering technique for surface modification. In order to implant atoms to whole surface of each particles, we used an electromagnetic vibrator at frequency of 120 Hz as an agitator. Cu<SUP>-</SUP> ions were implanted at 70 and 40 keV with 1.1 × 10<SUP>16</SUP> ions/cm<SUP>2</SUP> into an agitated spherical glass powder and flat glass plate. From XPS analysis, the uniformity of implanted atoms among particles was found to be considerably good even in the simple agitation. The peak depth of Cu atoms in a spherical particle was found to be shallower that in the flat plate from both SIMS measurement and theoretical calculation.
- Journal of the Vacuum Society of Japan
Journal of the Vacuum Society of Japan 42(3), 345-348, 1999-03
The Vacuum Society of Japan