The Preparation of Ba1-xRbxBiOy Sputtering Films.

• NAOE Hiroyuki

  Dept. of Electrical and Electronic Engineering, Faculty of Engineering, Tottori University

• MITANI Yuzuru

  Dept. of Electrical and Electronic Engineering, Faculty of Engineering, Tottori University

• KITAGAWA Toshiyuki

  Dept. of Electrical and Electronic Engineering, Faculty of Engineering, Tottori University

• KISHIDA Satoru

  Dept. of Electrical and Electronic Engineering, Faculty of Engineering, Tottori University

• TODA Fumihiko

  Dept. of Electrical and Electronic Engineering, Faculty of Engineering, Tottori University

• TOKUTAKA Heizo

  Dept. of Electrical and Electronic Engineering, Faculty of Engineering, Tottori University

Bibliographic Information

Other Title

• Ｂａ１－ｘＲｂｘＢｉＯｙスパッタ薄膜の作製
• Ba1-xRbxBiOy スパッタ ハクマク ノ サクセイ

Abstract

We prepared the Ba_1-xRb_xBiO_y (BRBO) thin films by rf magnetron sputtering using He+ O₂ gas (He = 80%). The XPS results indicated that the BRBO thin films contained Ba, Rb, Bi and O. From the X-ray diffraction patterns and R-T characteristics of the BRBO films, we found thet the films were (110) -oriented, and that the resistance of the BRBO film were dependent on the film thickness.

Journal

• Shinku

  Shinku 42 (3), 365-367, 1999

  The Vacuum Society of Japan

Keywords

• Electrical and Electronic Engineering
• Surfaces, Coatings and Films
• Condensed Matter Physics

Details

• CRID: 1390282679042102144
• NII Article ID: 10002476609
• NII Book ID: AN00119871
• DOI: 10.3131/jvsj.42.365
• ISSN: 18809413
• ISSN: 05598516
• NDL BIB ID: 4716372
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4716372
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed