超小型質量分析計の反応性スパッタリングプロセス計測への応用 Application of Micropole Analyzers to the Measurement of Reactive Sputtering Processes
During reactive sputtering processes for TiN film fabrication, a small mass analyzer (Micropole analyzer) was used to study surface reaction kinetics and to measure ionic fluxes from the peripheral plasma toward the vessel wall. A rate limiting reaction of Ar<SUP>+</SUP>-induced desorption of N<SUB>2</SUB> has been identified and its reaction cross section is evaluated. Ion fluxes increase with the increase of the plasma potential for the total pressure above 0.25 Pa.
真空 42(3), 388-391, 1999-03
The Vacuum Society of Japan