ヘリウムプラズマ照射下における基板近傍のヘリウム原子励起温度測定 Measurement on Helium Excitation Temperature in the Vicinity of Substrate during Helium Plasma Irradiation

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著者

    • 広畑 優子 HIROHATA Yuko
    • 北海道大学工学部量子エネルギー工学専攻 Department of Nuclear Engineering, Faculty of Engineering, Hokkaido University
    • 日野 友明 HINO Tomoaki
    • 北海道大学工学部量エネルギー工学専攻 Department of Nuclear Engineering, Faculty of Engineering, Hokkaido University

抄録

Excitation temperature of helium atom in the vicinity of substrate in an ECR helium plasma was measured based on multi-thermal equilibrium (MTE).<BR>In the case of no substrate in the plasma, clear atomic line spectra of excited helium were not observed. The intensities of line spectra increased with the negative voltage biased at the substrate and the discharge pressure. The intensities were also strong at the position close to the substrate.<BR>From the Boltzmann plot, an excitation temperature of approximately 4000 K for helium atom was obtained. This temperature was a little higher in the case of lower pressure and farther from the substrate.

収録刊行物

  • 真空  

    真空 42(3), 392-395, 1999-03 

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10002476661
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    4716482
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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