多孔式電子ビーム励起プラズマソースの開発とダイヤモンド様炭素膜の作製 Preparation of Diamond-Like Carbon Film with Electron Beam Excited Plasma (EBEP) Source
A multi-hole type of electron beam excited plasma (EBEP) is developed and applied for depositing Diamond-Like Carbon (DLC) film. The bombarding ion energy at substrate surface is controlled by the electron beam from EBEP, without external bias power supply. The film has a uniformity of ± 4% in 80 mm diameter. A deposition rate of 1 nm/ sec is obtained. The ratio of luminescence to peak height at the wavenumber <I>k</I> = 1550 cm<SUP>-1</SUP> in Raman spectrum of DLC film decreased by changing electron beam acceleration voltage from 30 V to 200 V. Moreover the formation of DLC film on glass substrate is successfully obtained without bias power supply.
真空 42(3), 401-404, 1999-03
The Vacuum Society of Japan