Preparation of Diamond-Like Carbon Film with Electron Beam Excited Plasma(EBEP) Source.

• SAITO Hironori

  Nichimen Electronic Technology Corporation

• TADA Shigekazu

  Nichimen Electronic Technology Corporation

• SUZUKI Tsuyoshi

  Nichimen Electronic Technology Corporation

• MUTO Harunobu

  Irie Koken Co., Ltd.

• HAMAGAKI Manabu

  The Institute of Physical and Chemical Research (RIKEN)

• SAKAMOTO Yuichi

  Nichimen Electronic Technology Corporation

Bibliographic Information

Other Title

• 多孔式電子ビーム励起プラズマソースの開発とダイヤモンド様炭素膜の作製
• タコウシキ デンシ ビーム レイキ プラズマソース ノ カイハツ ト ダイヤモンド ヨウ タンソ マク ノ サクセイ

Abstract

A multi-hole type of electron beam excited plasma (EBEP) is developed and applied for depositing Diamond-Like Carbon (DLC) film. The bombarding ion energy at substrate surface is controlled by the electron beam from EBEP, without external bias power supply. The film has a uniformity of ± 4% in 80 mm diameter. A deposition rate of 1 nm/ sec is obtained. The ratio of luminescence to peak height at the wavenumber k = 1550 cm^-1 in Raman spectrum of DLC film decreased by changing electron beam acceleration voltage from 30 V to 200 V. Moreover the formation of DLC film on glass substrate is successfully obtained without bias power supply.

Journal

• Shinku

  Shinku 42 (3), 401-404, 1999

  The Vacuum Society of Japan

Keywords

• Electrical and Electronic Engineering
• Surfaces, Coatings and Films
• Condensed Matter Physics

Details

• CRID: 1390001204065408128
• NII Article ID: 10002476683
• NII Book ID: AN00119871
• DOI: 10.3131/jvsj.42.401
• ISSN: 18809413
• ISSN: 05598516
• NDL BIB ID: 4716524
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4716524
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed