Evaluatiuon of Surface Silicide Growth and Substrate Metal Interfaces with Field Ion Microscopy
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- TANAKA Hiroaki
- Department of Electrical Engineering, Nagasaki Institute of Applied Science
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- OKUNO Kimio
- Department of Electrical Engineering, Nagasaki Institute of Applied Science
Bibliographic Information
- Other Title
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- 表面シリサイド形成層と下地金属界面の電界イオン顕微鏡による評価
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Journal
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- 真空
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真空 42 (3), 422-, 1999-03
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Details
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- CRID
- 1571980073996108288
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- NII Article ID
- 10002476727
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- NII Book ID
- AN00119871
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- ISSN
- 05598516
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- Text Lang
- ja
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- Data Source
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- CiNii Articles