Evaluatiuon of Surface Silicide Growth and Substrate Metal Interfaces with Field Ion Microscopy

  • TANAKA Hiroaki
    Department of Electrical Engineering, Nagasaki Institute of Applied Science
  • OKUNO Kimio
    Department of Electrical Engineering, Nagasaki Institute of Applied Science

Bibliographic Information

Other Title
  • 表面シリサイド形成層と下地金属界面の電界イオン顕微鏡による評価

Search this article

Journal

  • 真空

    真空 42 (3), 422-, 1999-03

References(3)*help

See more

Details

  • CRID
    1571980073996108288
  • NII Article ID
    10002476727
  • NII Book ID
    AN00119871
  • ISSN
    05598516
  • Text Lang
    ja
  • Data Source
    • CiNii Articles

Report a problem

Back to top