Study on Silicon Surface Stress during Plasma Oxidation

• NARUSHIMA Tetsuya

  National Research Institute for Metals

• ITAKURA Akiko

  National Research Institute for Metals

• KAWABE Takaya

  University of Tsukuba, Institute of Physics

• KITAJIMA Masahiro

  National Research Institute for Metals

Bibliographic Information

Other Title

• プラズマ酸化過程におけるSiの表面応力の研究

Journal

• 真空

  真空 42 (3), 427-428, 1999-03

Details

• CRID: 1572543023949527168
• NII Article ID: 10002476739
• NII Book ID: AN00119871
• ISSN: 05598516
• Text Lang: ja
• Data Source:
  • CiNii Articles