Surface Cleanness of Transported Substrate by the XHV Continuous Integrated Process with Levitation Transports System
-
- TOSA Masahiro
- National Research Institute for Metals
-
- KASAHARA Akira
- National Research Institute for Metals
-
- LEE Kyung Sub
- National Research Institute for Metals
-
- YOSHIHARA Kazuhiro
- National Research Institute for Metals
Bibliographic Information
- Other Title
-
- 極高真空一貫プロセスにおける搬送試料の表面清浄性
Search this article
Journal
-
- 真空
-
真空 42 (3), 443-, 1999-03
- Tweet
Details 詳細情報について
-
- CRID
- 1571417124042684928
-
- NII Article ID
- 10002476790
-
- NII Book ID
- AN00119871
-
- ISSN
- 05598516
-
- Text Lang
- ja
-
- Data Source
-
- CiNii Articles