Preparation of Amorphous Carbon-Nitride Thin Films by RF Excited Beam Source with a Multicapillary Gas Feed

• OKAMOTO Akio

  Technology Research Institute of Osaka Prefecture

• NOSAKA Toshikazu

  Technology Research Institute of Osaka Prefecture

• YOSHITAKE Masaaki

  Technology Research Institute of Osaka Prefecture

• OGAWA Souichi

  Technology Research Institute of Osaka Prefecture

Bibliographic Information

Other Title

• マルチキャピラリーガス導入を用いた励起線源による窒化炭素薄膜の形成

Journal

• 真空

  真空 42 (3), 452-453, 1999-03

Details

• CRID: 1570572699112534656
• NII Article ID: 10002476808
• NII Book ID: AN00119871
• ISSN: 05598516
• Text Lang: ja
• Data Source:
  • CiNii Articles