Copper Nitride Thin Films Prepared by R. F. Magnetron Sputtering

• NOSAKA Toshikazu

  Technology Research Institute of Osaka Prefecture

• YOSHITAKE Masaaki

  Technology Research Institute of Osaka Prefecture

• OKAMOTO Akio

  Technology Research Institute of Osaka Prefecture

• OGAWA Soichi

  Technology Research Institute of Osaka Prefecture

• NAKAYAMA Yoshikazu

  Department of Physics and Electronics, Osaka Prefecture University

Bibliographic Information

Other Title

• 高周波マグネトロンスパッタ法による窒化銅膜の作製

Journal

• 真空

  真空 42 (3), 459-, 1999-03

Details

• CRID: 1573387448879637120
• NII Article ID: 10002476831
• NII Book ID: AN00119871
• ISSN: 05598516
• Text Lang: ja
• Data Source:
  • CiNii Articles