The Change in Ellipsometry Parameters during Hydrogenation of SiO_2

• ITAKURA Akiko

  National Research Institute of Metals

• NARUSHIMA Tetsuya

  National Research Institute of Metals

• KITAJIMA Masahiro

  National Research Institute of Metals

• SHIMIZU Tatsuo

  Texas Instruments, Tsukuba Research & Development Center Ltd.

• NISHIOKA Yasushiro

  Texas Instruments, Tsukuba Research & Development Center Ltd.

Bibliographic Information

Other Title

• 水素化が及ぼすシリコン表面の偏光解析パラメータの変化

Journal

• 真空

  真空 42 (3), 465-, 1999-03

Details

• CRID: 1570009749159110784
• NII Article ID: 10002476849
• NII Book ID: AN00119871
• ISSN: 05598516
• Text Lang: ja
• Data Source:
  • CiNii Articles