RF-IADプロセスによるTiO_2薄膜製作時のアルゴン及び酸素混合比に対する光学特性及び膜構造依存性

• TANG Q.

  Kobe Design Univ.

• OGURA S.

  Kobe Design Univ.

• KIKUCHI K.

  Shincron Co., Ltd.

Bibliographic Information

Other Title

• Development of Optical and Structural Properties of TiO_2 Thin Films on Mixed Ratio of Argon and Oxygen Ions in RF-IAD Process

Journal

• レーザー学会学術講演会年次大会講演予稿集 = Annual meeting, of the Laser Society of Japan digest of technical papers

  レーザー学会学術講演会年次大会講演予稿集 = Annual meeting, of the Laser Society of Japan digest of technical papers 16 152-, 1996-01-01

Details

• CRID: 1572261548975145344
• NII Article ID: 10002526339
• NII Book ID: AA11604265
• ISSN: 09136355
• Text Lang: en
• Data Source:
  • CiNii Articles